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The Center for Integrated Nanotechnologies (CINT) is a user-oriented research center whose mission is to provide the scientific basis for integration of nanoscale materials and enhanced performance. Research at CINT has an emphasis on exploring the path from scientific discovery to achieving new material properties and functionalities, including the integration of nanostructures into the micro and macro worlds.

Brookhaven Science Associates (BSA) is planning the procurement of an electron beam lithography (EBL) system for the CINT at Sandia National Laboratories (SNL). The lithography system will be procured by BSA on behalf of the CINT as part of the Nanoscale Science Research Center Recapitalization (NSRC-Recap) project. The lithography system, hereafter referred to as “Instrument”, shall be designed to facilitate the fabrication of sub-micron features down to the limits of current photomask materials, currently below 10nm. This new system will enable the innovations and discovery in areas of Quantum Material Systems, Nanomechanics, Nanophotonics and Nanomaterials.

BSA invites you to participate in accordance with the RFP letter and supporting enclosures. This requirement has been posted on the sam.gov website under Request for Proposals (RFP) 419165. Any questions concerning this RFP must be addressed via email to the attention of Maile Nichols at mnichols@bnl.gov.